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Plasma Sources for Thin Film Deposition and Etching, Volume 18

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Plasma Sources for Thin Film Deposition and Etching, Volume 18 - Francombe, Maurice H (Editor), and Vossen, John L (Editor)
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This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

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