Optical Imaging in Projection Microlithography


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Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general ...

Optical Imaging in Projection Microlithography 2005, SPIE-International Society for Optical Engineering

ISBN-13: 9780819458292


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