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Cmos Gate-stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

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Cmos Gate-stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 - Demkov, Alexander A. (Editor), and Taylor, Bill (Editor), and Harris, H. Rusty (Editor)

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and ...

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