Cathodoluminescence of Irradiated Hafnium Dioxide

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The purpose of this research is to understand the effect of radiation on HfO2 thin films, and to compare the quality of HfO2 thin films produced by both atomic layer deposition (ALD) and pulsed laser deposition (PLD); PLD samples had varying substrate temperatures during deposition (300-C, 500-C, and 750-C). The entirety of this research was conducted using cathodoluminescence (CL) as the examination method. The excitation source was a Kimball Physics EMG-12 electron gun. The photomultiplier tube contained a gallium ...

Cathodoluminescence of Irradiated Hafnium Dioxide 2012, Biblioscholar

ISBN-13: 9781249450955

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Cathodoluminescence of Irradiated Hafnium Dioxide 2012, Biblioscholar

ISBN-13: 9781249595694

Trade paperback

Select