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The Mocvd Challenge: Volume 2: A Survey of Gainasp-GAAS for Photonic and Electronic Device Applications
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Manijeh Razeghi
"The MOCVD Challenge: Volume 2, A Survey of GaInAsP-GaAs for Photonic and Electronic Device Applications" focuses on GaAs systems and devices grown by MOCVD, specifically MOCVD growth of GaAs and related alloys and GaInP for photonic and electronic applications. Along with Volume 1, this book provides a personal account of the author's own ...
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Preparation of Thin Films
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by
Joy George
"Preparation of Thin Films" provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide ...
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Thin-Film Deposition: Principles and Practice
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Donald L Smith, Smith Donald
Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description of the ...
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Theory and Application of Laser Chemical Vapor Deposition
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by
J Mazumder, Aravinda Kar
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference ...
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Principles of Chemical Vapor Deposition
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Daniel Mark Dobkin, Michael K Zuraw
"Principles of Chemical Vapor Deposition" provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to ...
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ULSI Applications
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by
Schmitz
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process ...
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Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications
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by
Arthur Sherman
This title presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films ...
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Modeling of chemical vapor deposition of tungsten films
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Chris R. Kleijn, Christoph Werner
Numerical modeling of reactors for chemical vapor deposition has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing ...
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Materials and Processes for Surface and Interface Engineering
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by
Yves Pauleau (Editor)
This guide has been written by experts in the fields of deposition technology and surface modification techniques and offers recent tutorial papers on the advances in surface and interface engineering. The emphasis is on fundamental aspects, principles and applications of plasma and ion beam processing technology. This handbook provides an ...
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Physical vapor deposition of thin films
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John T Mahan, John E Mahan
A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides ...
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Principles of Physical Vapor Deposition of Thin Films
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by
K S Sree Harsha
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. "Principles of Vapor Deposition of Thin Films" brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film ...
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Handbook of Chemical Vapor Deposition, 2nd Edition: Principles, Technology and Applications
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by
Hugh O Pierson
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere ...
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Metalorganic chemical vapor deposition for the heterostructure hot electron diode
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Mark A Emanuel
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Advanced Metallization and Interconnect Systems for ULSI Applications in 1997: Proceedings of the Conference Held September 30-October 2,1997, in San
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by
Robin Cheung (Editor), J Klein (Editor), Masato Murakami (Editor)
The scope of this conference has migrated to focus on the understanding, fabrication and application of copper or low-dielectric constant materials. At the same time, it has also retained its original emphasis on leading-edge material, interface and process science that has made the series so unique. The volume features two keynote addresses -- ...
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Handbook of Physical Vapor Deposition (Pvd) Processing
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by
Donald M Mattox
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films ...
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Chemical Vapor Deposited Materials Ngineering
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by
Francis S Galasso, Ann M Gibbins, OLE G Mouritsen (Contributions by)
"Chemical Vapour Deposited Materials" presents a concise description of the preparation, structure, and properties of some of the most important CVD materials needed in the development of high temperature technology. The author incorporates information from the literature with data from his own experience, which makes the book useful for improving ...
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Advanced Metallization and Interconnect Systems for ULSI Applications in 1995: Proceedings of the Conference Held October 3-5, 1995 in Portland, Orego
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by
Russell C Ellwanger (Editor), Shi-Qing Wang (Editor)
This volume is the 12th in a successful series previously known as Advanced Metallization for ULSI Applications. The addition of Interconnect Systems to the conference name is indicative of the growth and venue of topics which have been incorporated into the conference over the past several years. The volume features a keynote address on "Process ...
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Plasma Deposited Thin Films
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Mort/Jansen
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Chemical Vapor Deposition
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by
J Park (Editor)
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Advanced Metallization for ULSI Applications: Proceedings of the Conference Held October 8-10, 1991, at AT&T Bell Laboratories, Murray Hill, New Jersey, U.S.A., and October 28-30, 1991, Tokyo, Japan
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by
Virendra Vir Singh Rana
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Organometallic Vapor-Phase Epitaxy: Theory & Practice
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by
Gerald B Stringfellow (Editor)
This book describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the ...
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High vacuum production in the microelectronics industry
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by
Pierre Duval
Classical applications of vacuum in the semiconductor industry have until recently involved only inert and clean gases. This situation has changed radically because the new technologies, used for deposition (LPCVD...) as well as for plasma etching, all involve the use of dangerous, poisonous, toxic or/and corrosive gases. Both the users and the ...
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Photochemical Vapor Deposition
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by
J G Eden
Remote Sensing by Fourier Transform Spectrometry Reinhard Beer Here is a complete introduction to the specification, design, and implementation of Fourier Transform Spectrometers especially intended for atmospheric or astronomical remote sensing. Dr. Beer, one of the pioneers in this field, provides both specific and general information on the ...
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Plasma and Laser Processing of Materials
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by
Kamleshwar Upadhya (Editor), Minerals
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Rapid Thermal & Integrated Processing Vol. 224: Materials Research Society Symposium Proceedings
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by
R Singh (Editor), M L Green (Editor), J C Gelpey (Editor)
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