About this title: Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes ...
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Note: This is a general synopsis. Each listing is described below.
Binding: Paperback
Publisher: Cambridge University Press
Date Published: 2005
ISBN-13:9780521018005ISBN:0521018005
Description: BRAND NEW PAPERBACK. 10 by.47 inches. This book is printed on demand. (allow 1-2 weeks for printing)(232 pages) an up-to-date description of plasma etching and deposition in semiconductor fabrication. self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. suitable as a graduate-level textbook, and will also be a useful ... read more
Binding: Paperback
Publisher: Cambridge University Press
Date Published: 2005
ISBN-13:9780521018005ISBN:0521018005
Description: New. BRAND NEW and ready for dispatch. Delivery normally within 4/7 days. Our reputation is built on our Speedy Delivery Service and our Customer Service Team. read more
Binding: Hardback
Publisher: Cambridge University Press
Date Published: 1999
ISBN-13:9780521591751ISBN:0521591759
Description: BRAND NEW HARDBACK. 10.31 by.83 inches. (232 pages) an up-to-date description of plasma etching and deposition in semiconductor fabrication. self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry. ... read more
Binding: Paperback
Publisher: CAMBRIDGE UNIV PR
Date Published: 2005
ISBN-13:9780521018005ISBN:0521018005
Description: New. Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemist... read more
Description: New. Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry. read more
Binding: Paperback
Publisher: Cambridge University Press
Date Published: 2005
ISBN-13:9780521018005ISBN:0521018005
Description: New. Brand new books, maps and cd's available immediately from a reputable and well rated UK bookseller; despatched promptly and reliably worldwide. read more
Binding: Softcover
Publisher: Cambridge University Press
ISBN-13:9780521018005ISBN:0521018005
Description: New. PLEASE NOTE: All books are promptly imported from the UK using DHL or Royal Mail international mail WITH TRACKING NUMBER. Print on demand title. D elivery is typically 5-10 working days. Please do not select expedited shipping. Professional and reliable bookseller (est.1987). An up-to-date description of plasma etching and deposition in semiconductor fabrication. read more
Binding: Softcover
Publisher: Cambridge University Press
ISBN-13:9780521018005ISBN:0521018005
Description: New. Please note that deliveries to addresses in the UK and Europe will be in 4-14 business days. Other countries should refer to Alibris standard times. Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an ... read more
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