About this title: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. "Nanolithography" contains updated reviews by major experts on the well established techniques - electron beam lithography (EBL), ...
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Note: This is a general synopsis. Each listing is described below.
Binding: Hardback
Publisher: KLUWER ACADEMIC PUBLISHERS GROUP Country = NETHERLANDS
Date Published: 1994
ISBN-13:9780792327943ISBN:0792327942
Description: BRAND NEW HARDBACK. 228 pages. This book is printed on demand (allow 1-2 weeks for printing) contains reviews by on the techniques-electron beam lithography (ebl), x-ray lithography (xrl), ion beam lithography (ibl)-as well as on techniques, such as scanning tunnelling lithography (stl). 74 black & white illustrations, 74 black & white halftones (Hardback) read more
Binding: Hardback
Publisher: KLUWER ACADEMIC PUBL
Date Published: 2008
ISBN-13:9780792327943ISBN:0792327942
Description: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physi... read more
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